E-Book Overview
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
E-Book Content
HANDBOOK OF CHEMICAL VAPOR DEPOSITION (CVD) Principles, Technology, and Applications
Second Edition
by
Hugh O. Pierson Consultant and Sandia National Laboratories (retired) Albuquerque, New Mexico
NOYES PUBLICATIONS Park Ridge, New Jersey, U.S.A. WILLIAM ANDREW PUBLISHING, LLC Norwich, New York, U.S.A.
Copyright © 1999 by Noyes Publications No part of this book may be reproduced or utilized in any form or by any means, electronic or mechanical, including photocopying, recording or by any information storage and retrieval system, without permission in writing from the Publisher. Library of Congress Catalog Card Number: 99-26065 ISBN: 0-8155-1432-8 Printed in the United States Published in the United States of America by Noyes Publications / William Andrew Publishing, LLC Norwich, New York, U.S.A. 10 9 8 7 6 5 4 3 2 1
Library of Congress Cataloging-in-Publication Data Pierson, Hugh O. Handbook of chemical vapor deposition / by Hugh O. Pierson. -- 2nd ed. p. cm. Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992 Includes bibliographical references. ISBN 0-8