Within the last 30 years, electron energy-loss spectroscopy (EELS) has become a standard analytical technique used in the transmission electron microscope to extract chemical and structural information down to the atomic level. In two previous editions, Electron Energy-Loss Spectroscopy in the Electron Microscope has become the standard reference guide to the instrumentation, physics and procedures involved, and the kind of results obtainable. Within the last few years, the commercial availability of lens-aberration correctors and electron-beam monochromators has further increased the spatial and energy resolution of EELS. This thoroughly updated and revised Third Edition incorporates these new developments, as well as advances in electron-scattering theory, spectral and image processing, and recent applications in fields such as nanotechnology. The appendices now contain a listing of inelastic mean free paths and a description of more than 20 MATLAB programs for calculating EELS data.
From reviews of the first and second edition: "The text....contains a wealth of practical detail and experimental insight....This book is an essential purchase for any microscopist who is using, or planning to use, electron spectroscopy or spectroscopic imaging." – JMSA"Provides the advanced student with an indispensible text and the experienced researcher with a valuable reference." -- American Scientist
Electron Energy-Loss Spectroscopy in the Electron Microscope Third Edition R.F. Egerton Electron Energy-Loss Spectroscopy in the Electron Microscope Third Edition 123 R.F. Egerton Department of Physics Avadh Bhatia Physics Laboratory University of Alberta Edmonton, AB, Canada
[email protected] ISBN 978-1-4419-9582-7 e-ISBN 978-1-4419-9583-4 DOI 10.1007/978-1-4419-9583-4 Springer New York Dordrecht Heidelberg London Library of Congress Control Number: 2011930092 1st edition: © Plenum Press 1986 2nd edition: © Plenum Press 1996 © Springer Science+Business Media, LLC 2011 All rights reserved. This work may not be translated or copied in whole or in part without the written permission of the publisher (Springer Science+Business Media, LLC, 233 Spring Street, New York, NY 10013, USA), except for brief excerpts in connection with reviews or scholarly analysis. Use in connection with any form of information storage and retrieval, electronic adaptation, computer software, or by similar or dissimilar methodology now known or hereafter developed is forbidden. The use in this publication of trade names, trademarks, service marks, and similar terms, even if they are not identified as such, is not to be taken as an expression of opinion as to whether or not they are subject to proprietary rights. Printed on acid-free paper Springer is part of Springer Science+Business Media (www.springer.com