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9 Topicsin Current Chemistry Fortschritte der Chemischen Forschung Plasma Chemistry I Editors: S. Vepr~ekand M. Venugopalan Springer-Verlag Berlin Heidelberg New York 1980 This series presents critical reviews of the present position and future trends in modern chemical research. It is addressed to all research and industrial chemists who wish to keep abreast of advances in their subject. As a rule, contributions are specially commissioned. The editors and publishers will, however, always be pleased to receive suggestions and supplementary information. Papers are accepted for "Topics in Current Chemistry" in English. ISBN 3-540-09825-9 Springer?Verlag Berlin Heidelberg New York ISBN 0-387-09825-9 Springer-Verlag New York Heidelberg Berlin Library of Congress Cataloging in Publication Data. Main entry under title: Plasma chemistry. (Topics in current chemistry ; 89--90) Bibliography: v. 1, p. ; v. 2, p. Includes indexes. 1. Plasma chemistryAddresses, essays, lectures. I. Series. QD1.F58 voL 89-90 [QD581] 540'.8s [541'042'4] 79-25770 This work is subject to copyright. All rights are reserved, whether the whole or part of the material is concerned, specifically those of translation, reprinting, re-use of illustrations, broadcasting, reproduction by photocopying machine or similar means, and storage in data hanks. Under § 54 of the German Copyright Law where copies are made for other than pr{vate use, a fee is payable to the publisher, tlae amount of the fee to be determined by agreement with the publisher. © by Springer-Vedag Berlin Heidelberg 1980 printed in Germany The use of registered names, trademarks, etc. in this publication does not imply, even in the absence of a specific statement, that such names are exempt from the relevant protective laws and regulations and therefore free for general use. Typesetting and printing: Schwetzinger Verlagsdruckerei GmbH, 6830 Schwetzingen. Bookbinding: Konrad Triltsch, Graphischer Betrieb, 8700 Wfirzburg 2152/3140-543210 Contents Elementary Plasma Reactions of Environmental Interest D. Smith and N. G. Adams Plasma-Materials Interactions and Impurity Control in Magnetically Confined Thermonuclear Fusion Machines D. M. Gruen, S. Vep~ek, and R. B. Wright 45 Preparation of Optical Waveguides with the Aid of Plasma-Activated Chemical Vapour Deposition at Low Pressures D. Kiippers and H. Lydtin 107 Subject Index 133 Author Index Volumes 26-89 135 Editors of this volume: Dr. Stanislav Vep[ek, Anorganisch-Chernisches Institut der Universit~t, Winterthurerstral3e 190, CH-8057 Ziirich Prof. Dr. Mundiyath Venugopalan, Department of Chemistry, Western Illinois University, Macomb, IL 61455, USA Editorial Board: Prof. Dr. Michael J. S. Dewar, Department of Chemistry, The University of Texas, Austin, TX 78712, USA Prof. Dr. Klaus Hafner, Institut fiir Organische Chemie der TH, Petersenstrafie 15, D-6100 Darmstadt, FRG Prof. Dr. Edgar Heilbronner, Physikalisch-Chemisches Institut der Universit~it, KlingelbergstraBe 80, CH-4000 Basel Prof. Dr. Sh6 ItS, Department of Chemistry, Tohoku University, Sendai, Japan 980 Prof. Dr. Jean-Marie Lehn, Institut de Chimie, Universit6 de Strasbourg, 1. rue Blaise Pascal, B. P. 2 9 6 ~ 8 , F-67008 Strasbourg-Cedex Prof. Dr. Kurt Niedenzu, University of Kentucky, College of Arts and Sciences, Department of Chemistry, Lexington. KY 40506, USA Prof. Dr. Charles W. Rees, Hofmann Professor of Organic Chemistry, Department of Chemistry, Imperial College of Science and Technology, South Kensington, London SW72AY. England Prof. Dr. Klaus Schiller, Institut ftir Physikalische Chemic der Uuiversit~it, Im Neuenheimer Feld 253, D-6900 Heidelberg 1, FRG Prof. Dr. Georg Witting, Institut f/Jr Organische Chemic der Universit~it, Ira Neuenheimer Feld 270