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ADVANCES IN IMAGING AND ELECTRON PHYSICS VOLUME 102
EDITOR-IN-CHIEF
PETER W. HAWKES CEMESILuboratoire d 'Optique Electmnique du Centre National de la Recherche Scientifque Toulouse, France
ASSOCIATE EDITORS
BENJAMIN KAZAN Xerox Corporation Palo Alto Reseurch Center Palo Alto, California
TOM MULVEY Department of Electronic Engineering and Applied Physics Aston University Birmingham, United Kingdom
Advances in
Imaging and Electron Physics EDITEDBY PETER W. HAWKES CEMESILaboratoire d 'Optique Electronique du Centre National de la Recherche Scientifique
Toulouse, France
VOLUME 102
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CONTENTS CONTRIBUTORS .. F%EFACE . . . .
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vii ix
Finite Element Methods for the Solution of 3D Eddy Current Problems R. ALBANESE AND G. RU~INACCI 1.Introduction . . . . . . . . . . . . . . . . . . . . . 2 4 11. Field Equations and Material Properties . . . . . . . . . . 9 111. Fields. Potentials. and Gauges . . . . . . . . . . . . . . 15 IV. Edge Elements for 3D Field Problems and Vector Potentials . . . 30 V. Integral Formulations for Linear and Nonlinear Eddy Currents . . 50 VI. Differential Formulations and Constitutive Error Approach . . . 81 VII. Discussion and Conclusions . . . . . . . . . . . . . . . References . . . . . . . . . . . . . . . . . . . . . 82
Nanofabrication for Electronics
w. CHEN AND H. m
I. Introduction . . . . . . . . . . I1. Nanofabrication Methods . . . . 111. Pattern Transfer . . . . . . . IV. Resolution Limit of Organic Resists V. Applications of Nanostructures . . VI. Conclusion . . . . . . . . . . References . . . . . . . . . .
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87 90 125 138 158 174 176
Miniature Electron Optics A. D. FEINERMANAND D.A. CREW
I. Introduction ............. IT. Scaling Laws for Electrostatic Lenses . . . 111. Fabrication of Miniature Electrostatic Lenses IV