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Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject. short version, TJE_ Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject
E-Book Content
Plasma-Materials Interactions A Series Edited by
Orlando Auciello
Daniel L. Flamm
Microelectronics Center of AT&T Bell Laboratories North Carolina and Murray Hill New Jersey North Carolina State University Research Triangle Park, North Carolina
Advisory Board
J. L. Cecchi
W. O. Hofer
Plasma Physics Laboratory Princeton University Princeton, New Jersey
Institut für Grenzflächenforschung und Vakuumphysik Jülich, Federal Republic of Germany
A. E. deVries
N. Itoh
FOM-Instituut voor Atoom-En Molecuulfysica Amsterdam- Watergraafasmeer The Netherlands
Department of Crystalline Materials Science Nagoya University Nagoya, Japan
H. F. Winters
G. M. McCracken
IBM, Almaden Research Center San Jose, California
Culham Laboratory Abingdon, Oxfordshire United Kingdom
A list of titles in this series appears at the end of this volume.
Plasma Diagnostics
Volume 2
Surface Analysis and Interactions
Edited by
Orlando Auciello Microelectronics Center of North Carolina and North Carolina State University Research Triangle Park, North Carolina
Daniel L. Flamm A T& T Bell Laboratories Murray Hill, New Jersey
A C A D E M I C PRESS, I N C . Harcourt Brace Jovanovich, Publishers Boston San Diego New York Berkeley London Sydney Tokyo Toronto
Copyright © 1989 by Academic Press, Inc. All rights reserved. No part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher.
ACADEMIC PRESS, INC. 1250 Sixth Avenue, San Diego, CA 92101
United Kingdom Edition published by ACADEMIC PRESS, INC. (LONDON) LTD. 24-28 Oval Road, London NW1 7DX
Library of Congress Cataloging-in-Publication Data Plasma diagnostics. (Plasma-materials interactions) Includes bibliographies and index. Contents: v. 1. Discharge parameters and chemistry —v. 2. Surface analysis and interactions. 1. Plasma diagnostics. I. Auciello, Orlando, DateII. Flamm, Daniel L. III. Series. QC718.5.D5P54 1988 530.41 87-35161 ISBN 0-12-067635-4 (v. 1) ISBN 0-12-067636-2 (v. 2)
Printed in the United States of America 89 90 91 92 9 8 7 6 5 4 3 2 1
Contributors
Numbers in parentheses refer to the pages on which the authors' contributions begin. D. E. ASPNES (67), Bell Communications Research, Inc., Red Bank, New Jersey 07701-7020 B. K. BEIN (211), Ruhr-Universität Bochum, Institut für Experimentalphysik VI, D-4630 Bochum, PO Box 102148, Fe