Handbook Of Semiconductor Wafer Cleaning Technology - Science, Technology, And Applications

HANDBOOK OF SEMICONDUCTOR WAFER CLEANING TECHNOLOGY Science, Technology, and Applications Edited by Werner Kern Werner Kern Associates East Windsor, New Jersey NOYES PUBLICATIONS WeStwOOd,New Jersey, U.S.A. Copyright 8 1993 by Noyes Publications No part of this book may be reproduced or utilized in any form or by any means, electronic or mechanical, including photocopying, recording or by any information storage and retrieval system, without permission in writing from the Publisher. Library of Congress Catalog Card Number: 93-4078 ISBN: O-8155-1331-3 Printed in the United States Published in the United States of America by Noyes Publications Fairview Avenue, Westwood, New Jersey 07675 1098765 Library of Congress Cataloging-in-Publication Data Handbook of semiconductor wafer cleaning technology : science, technology, and applications /edited by Werner Kern. Gill. P. Includes bibliographical references and index. ISBN O-8155-1331-3 1. Semiconductor wafers--Cleaning. TK7871.85.H335 621.3815%-dc20 1993 1. Kern, Werner. 93-4078 CIP 1925- Preface The cleaning of semiconductor critical operations in the fabrication advanced scientific ULSI silicon circuits, wafers has become one of the most of semiconductor devices, especially A considerable literature has been published body of technical and on this important subject; however, it is widely dispersed in numerous journals and symposia proceedings. It is the objective of this book to bring together in one volume all pertinent knowledge on semiconductorwafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. The book provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are recognized experts in each topic. The scope of this book is very broad, covering all aspects of wafer cleaning. Emphasis is on practical applications in the fab combined with authoritative scientific background information to provide a solid scientific basisforthe understanding of the chemical and physical processes involved in cleaning and in the analytical methods of testing and evaluation. This user-friendly handbook has been based on lectures presented in an intensive two-day course on wafer cleaning technology that was organized by the editor and held in San Francisco and Princeton with the of several of the chapter authors. The enthusiastic response participation by the course attendees convinced us that a book treating this material in greater depth in the format of topical overviews is indeed highly desirable, if not urgently needed. vii viii Preface In setting out to create a comprehensive handbook that would fulfill this need, each chapter author or group of co-authors contributed specialized and complementary expert knowledge in covering this multidisciplinary subject. The book comprises the following fiv