Elemental Sulfur And Sulfur-rich Compounds I

230 Topics in Current Chemistry Editorial Board: A. de Meijere · K.N. Houk · H. Kessler · J.-M. Lehn S.V. Ley · S.L. Schreiber · J. Thiem · B.M. Trost F. V
gtle · H. Yamamoto D Berlin Heidelberg New York Hong Kong London Milan Paris Tokyo Elemental Sulfur and Sulfur-Rich Compounds I Volume Editor: Ralf Steudel With contributions by B. Eckert · A.J.H. Janssen · A. de Keizer W. E. Kleinjan · I. Krossing · R. Steudel · Y. Steudel M. W. Wong BD The series Topics in Current Chemistry presents critical reviews of the present and future trends in modern chemical research. The scope of coverage includes all areas of chemical science including the interfaces with related disciplines such as biology, medicine and materials science. The goal of each thematic volume is to give the nonspecialist reader, whether at the university or in industry, a comprehensive overview of an area where new insights are emerging that are of interest to a larger scientific audience. As a rule, contributions are specially commissioned. The editors and publishers will, however, always be pleased to receive suggestions and supplementary information. Papers are accepted for Topics in Current Chemistry in English. In references Topics in Current Chemistry is abbreviated Top Curr Chem and is cited as a journal. Springer WWW home page: http://www.springer.de Visit the TCC home page at http://www.springerlink.com ISSN 0340-1022 ISBN 3-540-40191-1 DOI 10.1007/b12115 Springer-Verlag Berlin Heidelberg New York Library of Congress Catalog Card Number 74-644622 This work is subject to copyright. All rights are reserved, whether the whole or part of the material is concerned, specifically the rights of translation, reprinting, reuse of illustrations, recitation, broadcasting, reproduction on microfilms or in any other ways, and storage in data banks. Duplication of this publication or parts thereof is only permitted under the provisions of the German Copyright Law of September 9, 1965, in its current version, and permission for use must always be obtained from Springer-Verlag. Violations are liable for prosecution under the German Copyright Law. Springer-Verlag Berlin Heidelberg New York a member of BertelsmannSpringer Science+Business Media GmbH http://www.springer.de
Springer-Verlag Berlin Heidelberg 2003 Printed in Germany The use of general descriptive names, registered names, trademarks, etc. in this publication does not imply, even in the absence of a specific statement, that such names are exempt from the relevant protective laws and regulations and therefore free for general use. Cover design: KnkelLopka, Heidelberg/design & production GmbH, Heidelberg Typesetting: Strtz AG, 97080 Wrzburg 02/3020 ra – 5 4 3 2 1 0 – Printed on acid-free paper Volume Editor Prof. Dr. Ralf Steudel Technische Universitt Berlin Institut fr Chemie / Sekr. C2 Straße des 17. Juni 135 10623 Berlin, Germany E-mail: [email protected] Editorial Board Prof. Dr. Armin de Meijere Prof. K.N. Houk Institut fr Organische Chemie der Georg-August-Universitt Tammannstraße 2 37077 Gttingen, Germany E-mail: [email protected] Department of Chemistry and Biochemistry Un