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Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.
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HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY Principles, Deposition, Film Modification and Synthesis Jerome J. Cuomo Stephen M. Rossnagel Harold R. Kaufman William Andrew Inc. HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES Editors Rointan F. Bunshah, University of California, Los Angeles (Materials Science and Technology) Gary E. McGuire, Microelectronics Center of North Carolina (Electronic Materials and Processing) DEPOSITION TECHNOLOGIES FOR FILMS AND COATINGS: by Rointan F. Bunshah et al CHEMICAL VAPOR DEPOSITION IN MICROELECTRONICS: by Arthur Sherman SEMICONDUCTOR MATERIALS AND PROCESS TECHNOLOGY HANDBOOK: edited by Gary E. McGuire SOL-GEL TECHNOLOGY FOR THIN FILMS, FIBERS, PREFORMS, ELECTRONICS AND SPECIALTY SHAPES: edited by Lisa A. Klein HYBRID MICROCIRCUIT TECHNOLOGY HANDBOOK: by James J. Licari and Leonard R. Enlow HANDBOOK OF THIN FILM DEPOSITION PROCESSES AND TECHNIQUES: edited by Klaus K. Schuegraf IONIZED-CLUSTER BEAM DEPOSITION AND EPITAXY: by Toshinori Takagi DIFFUSION PHENOMENA IN THIN FILMS AND MICROELECTRONIC MATERIALS: edited by Devendra Gupta and Paul S. Ho SHOCK WAVES FOR INDUSTRIAL APPLICATIONS: edited by Lawrence E. Murr HANDBOOK OF CONTAMINATION edited by Donald L. Tolliver CONTROL IN MICROELECTRONICS: HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY: edited by Jerome J. Cuomo, Stephen M. Rossnagel, and Harold R. Kaufman FRICTION AND WEAR TRANSITIONS OF MATERIALS: by PeterJ. Blau CHARACTERIZATION OF SEMICONDUCTOR MATERIALS-Volume 1: edited by Gary E. McGuire SPECIAL MELTING AND PROCESSING TECHNOLOGIES: edited by G.K. Bhat Related Titles ADHESIVES TECHNOLOGY HANDBOOK: by Arthur H. Landrock HANDBOOK OF THERMOSET PLASTICS: edited by Sidney H. Goodman SURFACE PREPARATION TECHNIQUES FOR ADHESIVE BONDING: by Raymond F. Wegman HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY Principles, Deposition, Film Modification and Synthesis Reprint Edition Edited by Jerome J. Cuomo and Stephen M. Rossnagel IBM Thomas J. Watson Research Center Yorktown Heights, New York Harold R. Kaufman Front Range Research Fort Collins, Colorado and Commonwealth Scientific Corporation Alexandria, Virginia NOYES PUBLICATIONS Westwood, New Jersey, U.S.A. Copyright © 1989 by Noyes Publications No part of this book may be reproduced or utilized in any form or by any means, electronic or mechanical, including photocopying, recording or by any information storage and retrieval system, without perm ission in writing from the Publisher. Library of Congress Catalog Card Number: 88-38244 ISBN: 0-8155-1199-X Printed in the United States Published in the United States of America by Noyes Publications Fairview Avenue, Westwood, New Jersey 07675 109876543 Library of Congress Cataloging-in-Publication Data Handbook of ion beam processing technology : principles, deposition, film modification, and synthesis / edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman. p. cm. Includes bibliographies and index. ISBN 0-8155-1199-X : 1. Ion implantation. 2. Ion bombardment--I ndustrial applications. I. Cuomo, J.J. II. Rossnagel, Stephen M. III. Kaufman, Harold R. aC702.7.155H36 1989 621.381'7--dc19 88-38244 CIP About the Editors Jerome J. Cuomo is presently Manager of the Materials Processing Laboratory at the IBM T.J. Watson Research Center, Yorktown Heights, New York. He is particularly involved in the study of sputtering, ion beam and plasma processing, and is the author or co-author of 55 patents. He has made important contributions t