Introduction To Surface And Thin Film Processes

Introduction to Surface and Thin Film Processes JOHN A. VENABLES Cambridge University Press Introduction to Surface and Thin Film Processes This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of electronic, atomic and vibrational structure are emphasized throughout. The book provides extensive leads into practical and research literature, as well as to resources on the World Wide Web. Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practioners in physics, chemistry, materials science and engineering. J   A. V      obtained his undergraduate and graduate degrees in Physics from Cambridge. He spent much of his professional life at the University of Sussex, where he is currently an Honorary Professor, specialising in electron microscopy and the topics discussed in this book. He has taught and researched in laboratories around the world, and has been Professor of Physics at Arizona State University since 1986. He is currently involved in web-based (and web-assisted) graduate teaching, in Arizona, Sussex and elsewhere. He has served on several advisory and editorial boards, and has done his fair share of reviewing. He has published numerous journal articles and edited three books, contributing chapters to these and others; this is his first book as sole author. This Page Intentionally Left Blank Introduction to Surface and Thin Film Processes JOHN A. VENABLES Arizona State University and University of Sussex PUBLISHED BY CAMBRIDGE UNIVERSITY PRESS (VIRTUAL PUBLISHING) FOR AND ON BEHALF OF THE PRESS SYNDICATE OF THE UNIVERSITY OF CAMBRIDGE The Pitt Building, Trumpington Street, Cambridge CB2 IRP 40 West 20th Street, New York, NY 10011-4211, USA 477 Williamstown Road, Port Melbourne, VIC 3207, Australia http://www.cambridge.org © John A. Venables 2000 This edition © John A. Venables 2003 First published in printed format 2000 A catalogue record for the original printed book is available from the British Library and from the Library of Congress Original ISBN 0 521 62460 6 hardback Original ISBN 0 521 78500 6 paperback ISBN 0 511 01273 X virtual (netLibrary Edition) Contents Preface Chapter 1 Introduction to surface processes page xi 1 1.1 Elementary thermodynamic ideas of surfaces 1.1.1 Thermodynamic potentials and the dividing surface 1.1.2 Surface tension and surface energy 1.1.3 Surface energy and surface stress 1.2 Surface energies and the Wulff theorem 1.2.1 General considerations 1.2.2 The terrace–ledge–kink model 1.2.3 Wulff construction and the forms of small crystals 1.3 Thermodynamics versus kinetics 1.3.1 Thermodynamics of the vapor pressure 1.3.2 The kinetics of crystal growth 1.4 Introduction to surface and adsorbate reconstructions 1.4.1 Overview 1.4.2 General comments and notation 1.4.3 Examples of (1⫻1) structures 1.4.4 Si(001) (2⫻1) and related semiconductor structures 1.4.5 The famous 7⫻7 stucture of Si(111) 1.4.6 Various ‘root-three’ structures 1.4.7 Polar semiconductors, such as G